Intel Sets Chipmaking Milestone With First High NA EUV Tool For Next-Gen Chips
Intel's foundry arm says it has crossed a major lithography milestone: it has announced successful acceptance testing of ASML's TWINSCAN EXE:5200B High Numerical Aperture (High-NA) EUV scanner, one of the most advanced chipmaking tools currently in existence anywhere. It's the first time the higher-throughput version of ASML's High-NA platform 





